Molecular adsorption and dissociative reaction of oxygen on the surface

Physical Review B - Condensed Matter and Materials Physics

Volumn 61, Issue 7, 2000, Pages 4705-4713

  Hoshino, T ^a   Nishioka, Y ^a  

^a Texas Instruments Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001465721     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.61.4705     Document Type: Article

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