Nickel silicide thin films as masking and structural layers for silicon bulk micro-machining by potassium hydroxide wet etching

Journal of Micromechanics and Microengineering

Volumn 18, Issue 9, 2008, Pages

  Bhaskaran, M ^a   Sriram, S ^a   Sim, L W ^a  

^a RMIT UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749117715     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/9/095002     Document Type: Article

References (6)

1. 2, and NiSi for thin-film silicon-on-insulator applications J. Electrochem. Soc. 144 2437-42
2. Bhaskaran M, Sriram S, Short K T, Mitchell D R G, Holland A S and Reeves G K 2007 Characterization of C54 titanium silicide thin films by spectroscopy, microscopy and diffraction J. Phys. D: Appl. Phys. 40 5213-9
3. Bhaskaran M, Sriram S, Holland A S and Evans P J 2008 Characterisation of nickel silicide thin films by spectroscopy and microscopy techniques Micron doi:10.1016/j.micron.2007.12.008
4. Frühauf J 2005 Shape and Functional Elements of the Bulk Silicon Microtechnique: A Manual of Wet-Etched Silicon Structures (Berlin: Springer) p 11
5. Cardinale G F, Howitt D G, Cliff W M, McCarty K F, Medlin D L, Mirkarimi P B and Moody N R 1996 Micromachined silicon cantilever beams for thin-film stress measurement Thin Solid Films 287 214-9
6. Qin M, Poon M C and Yuen C Y 2000 A study of nickel silicide film as a mechanical material Sensors Actuators A 87 90-5