-
1
-
-
0024133520
-
LIGA process; Sensor construction techniques via X-ray lithography
-
Hilton Head Island, SC
-
W. Ehrfeld, F. Gotz, D. Munchmeyer, W. Schelb, and D. Schmidt,"LIGA process; Sensor construction techniques via X-ray lithography," in Proc. Solid-State Sens. Actuator Workshop, Hilton Head Island, SC, 1988, pp. 1-4.
-
(1988)
Proc. Solid-State Sens. Actuator Workshop
, pp. 1-4
-
-
Ehrfeld, W.1
Gotz, F.2
Munchmeyer, D.3
Schelb, W.4
Schmidt, D.5
-
2
-
-
0004884672
-
The LIGA process for the fabrication of micromechanical and mirooptical components
-
Berlin, Germany
-
P. Bley, J. Gottert, M. Harmening, M. Himmelhaus, W. Menz, J. Mohr, C. Muller, and U. Wallrabe, "The LIGA process for the fabrication of micromechanical and mirooptical components," in Micro System Technologies, Berlin, Germany, 1991, pp. 302-314.
-
(1991)
Micro System Technologies
, pp. 302-314
-
-
Bley, P.1
Gottert, J.2
Harmening, M.3
Himmelhaus, M.4
Menz, W.5
Mohr, J.6
Muller, C.7
Wallrabe, U.8
-
3
-
-
0031186211
-
Excimer laser micromachining for rapid fabrication of diffractive optical elements
-
G. P. Behrmann and M. T. Duignan, "Excimer laser micromachining for rapid fabrication of diffractive optical elements," Appl. Opt., vol. 36, pp. 4666-4676, 1997.
-
(1997)
Appl. Opt
, vol.36
, pp. 4666-4676
-
-
Behrmann, G.P.1
Duignan, M.T.2
-
4
-
-
0031221057
-
SU-8: A low-cost negative resist for MEMS
-
H. Lorenz, M. Despont, N. Fahrni, N. LaBianca, P. Renaud, and P. Vettiger, "SU-8: A low-cost negative resist for MEMS," J. Micromech. Microeng., vol. 7, pp. 121-124, 1997.
-
(1997)
J. Micromech. Microeng
, vol.7
, pp. 121-124
-
-
Lorenz, H.1
Despont, M.2
Fahrni, N.3
LaBianca, N.4
Renaud, P.5
Vettiger, P.6
-
5
-
-
0030677606
-
High-aspect-ratio ultrathick, negative-tone near-UV photoresist for MEMS applications
-
M. Despont, H. Lorenz, N. Fahrni, J. Brugger, P. Renaud, and P. Vettiger, "High-aspect-ratio ultrathick, negative-tone near-UV photoresist for MEMS applications," in Proc. IEEE Microelectromech. Syst., 1997, pp. 518-522.
-
(1997)
Proc. IEEE Microelectromech. Syst
, pp. 518-522
-
-
Despont, M.1
Lorenz, H.2
Fahrni, N.3
Brugger, J.4
Renaud, P.5
Vettiger, P.6
-
6
-
-
0012048241
-
High aspect ratio structures achieved by sacrificial conformal coating
-
Hilton Head Island, SC
-
F. Cros and M. G. Allen, "High aspect ratio structures achieved by sacrificial conformal coating," in Proc. Solid-State Sensor and Actuator Workshop, Hilton Head Island, SC, 1998, pp. 261-264.
-
(1998)
Proc. Solid-State Sensor and Actuator Workshop
, pp. 261-264
-
-
Cros, F.1
Allen, M.G.2
-
7
-
-
0035125116
-
Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS
-
J. Zhang, K. L. Tan, G. D. Hong, L. J. Yang and H. Q. Gong, "Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS," J. Micromech. Microeng., vol. 11, pp. 20-26, 2001.
-
(2001)
J. Micromech. Microeng
, vol.11
, pp. 20-26
-
-
Zhang, J.1
Tan, K.L.2
Hong, G.D.3
Yang, L.J.4
Gong, H.Q.5
-
8
-
-
3142780515
-
Application of 3D glycerol-compensated inclined-exposure technology to an integrated optical pick-up head
-
K. Y. Hung, H. T. Hu, F. G. Tseng, "Application of 3D glycerol-compensated inclined-exposure technology to an integrated optical pick-up head", J. micromech. microeng. 14, pp. 975-983, 2004
-
(2004)
J. micromech. microeng
, vol.14
, pp. 975-983
-
-
Hung, K.Y.1
Hu, H.T.2
Tseng, F.G.3
-
9
-
-
33749995299
-
Multidirectional UV Lithography for Complex 3-D MEMS Structures
-
OCT
-
Y. K. Yoon, J. H. Park, M. G. Allen, "Multidirectional UV Lithography for Complex 3-D MEMS Structures," Journal of microelectromechanical system, VOL. 15, NO. 5, OCT, 2006, pp1121-1130
-
(2006)
Journal of microelectromechanical system
, vol.15
, Issue.5
, pp. 1121-1130
-
-
Yoon, Y.K.1
Park, J.H.2
Allen, M.G.3
-
10
-
-
0029429020
-
Fabrication of 45 Mirrors Together with Well-Defined V-Grooves Using Wet Anisotropic Etching of Silicon
-
Dec
-
C. Strandman, L. Rosengren, H. G A. Elderstig, Ylva Backlund, "Fabrication of 45 Mirrors Together with Well-Defined V-Grooves Using Wet Anisotropic Etching of Silicon," Journal of microelectromechanical systems, VOL. 4, NO. 4, Dec 1995, pp213-219
-
(1995)
Journal of microelectromechanical systems
, vol.4
, Issue.4
, pp. 213-219
-
-
Strandman, C.1
Rosengren, L.2
Elderstig, H.G.A.3
Backlund, Y.4
-
11
-
-
0343773238
-
Anisotropic etching of {100} and {110} planes in (100) silicon
-
O. Powell and H. B. Harrison, "Anisotropic etching of {100} and {110} planes in (100) silicon," Journal of Micromechanics and Microengineering, Vol. 11, No. 3, pp. 217-220, 2001.
-
(2001)
Journal of Micromechanics and Microengineering
, vol.11
, Issue.3
, pp. 217-220
-
-
Powell, O.1
Harrison, H.B.2
-
12
-
-
54549096649
-
-
th International Workshop on High-Aspect-Ratio Micro-Structure Technology, Besancon, FRANCE, June 7-9, 2007.
-
th International Workshop on High-Aspect-Ratio Micro-Structure Technology, Besancon, FRANCE, June 7-9, 2007.
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