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Applied Physics A: Materials Science and Processing

Volumn 93, Issue 3, 2008, Pages 751-758

Critical role of laser wavelength on carbon films grown by PLD of graphite

(6) Cappelli, E a Scilletta, C a Mattei, G a Valentini, V a Orlando, S b Servidori, M b

a CNR ISC (Italy)

b CNR (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; AMORPHOUS CARBON; AMORPHOUS MATERIALS; CARBON; EXCIMER LASERS; FIELD EMISSION; GAS LASERS; GRAPHITE; LASER ABLATION; LASER APPLICATIONS; LASER PULSES; LASERS; NEODYMIUM LASERS; PHOTORESISTS; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SUBSTRATES; SURFACE ROUGHNESS; THICK FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ARF EXCIMER LASERS; AROMATIC CLUSTERS; CARBON MATERIALS; CARBON NANO-STRUCTURES; CHARACTERISATION; DEPOSITION TEMPERATURES; DIRECT FUNCTIONS; EMISSION PROPERTIES; EXPERIMENTAL CONDITIONS; FIELD EMISSION MEASUREMENTS; FILM DENSITIES; FILM STRUCTURES; FLUENCE; GRAPHENE; GRAPHITE TARGETS; GRAZING INCIDENCES; IN VACUUMS; LASER WAVELENGTHS; MACROSCOPIC SURFACES; NEAR-IR; PULSED ND:YAG LASERS; RANGING; SUBSTRATE TEMPERATURES; TETRAHEDRAL AMORPHOUS CARBONS; THIN CARBON FILMS; THIN-FILMS; X-RAY REFLECTIVITIES; XRD ANALYSES;

CARBON FILMS;

EID: 54549114987 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4708-7 Document Type: Article

Times cited : (22)

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