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Volumn 201, Issue 11, 2004, Pages

Wafer curvature in the nonlinear deformation range

Author keywords

[No Author keywords available]

Indexed keywords

DEFORMATION; DOPING (ADDITIVES); EPITAXIAL GROWTH; PROBLEM SOLVING; SILICON; STRAIN; STRESS ANALYSIS; SUBSTRATES; THICKNESS MEASUREMENT;

DEFORMATION RANGE; HETEROEPITAXIAL GROWTH; THIN FILM DEPOSITION; WAFER CURVATURE;

NONLINEAR OPTICS;

EID: 5444265645 PISSN: 00318965 EISSN: None Source Type: Journal
DOI: 10.1002/pssa.200409058 Document Type: Article

Times cited : (29)

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