Cyclotron resonance measurements of Si/SiGe two-dimensional electron gases with differing strain

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1655-1658

  Griffin, N ^a   Arnone, D D ^b   Paul, D J ^a   Pepper, M ^a,b   Robbins, D J ^c   Churchill, A C ^c   Fernandez J M ^d  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b TOSHIBA CORPORATION   (Japan)

^c DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

^d IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5444261487     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589955     Document Type: Article

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