High-resolution x-ray masks for high aspect ratio microelectromechanical systems applications

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 3, 2004, Pages 423-428

  Wang, Lin ^a   Christenson, Todd ^b   Desta, Yohannes M ^a   Fettig, Rainer K ^c   Goettert, Jost ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

High aspect ratio microstructures (HARMs); Intermediate mask; LIGA; Silicon nitride membrane; X ray mask

Indexed keywords

INTERMEDIATE MASKS; MASK MEMBRANES; X RAY MASKS;

ASPECT RATIO; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; ELECTROPLATING; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; POLYMETHYL METHACRYLATES; SURFACE ROUGHNESS; X RAY LITHOGRAPHY;

MASKS;

EID: 5444254654     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/11753271     Document Type: Conference Paper

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