Transparent masks for aligned deep X-ray lithography/LIGA: Low-cost well-performing alternative using glass membranes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3512, Issue , 1998, Pages 271-276

  Kupka, Roland K ^a   Megtert, Stephan ^a   Roulliay, Marc ^a   Bouamrane, Faycal ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; MASKS; SEMICONDUCTING GLASS;

DEEP X RAY LITHOGRAPHY; GLUED-ON THIN GLASS MEMBRANE; MICROFABRICATIONS;

X RAY LITHOGRAPHY;

EID: 0032293164     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)