Effects of substrate temperature on the initial growth of titanium silicides on Si(111)

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 7 B, 2004, Pages 4537-4540

  Hsu, H C ^a   Hsu, H F ^a   Chiang, T F ^a   Liao, K F ^a   Chen, L J ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

AFM; Lattice mismatch; Nanorod; STM; Ti suicide

Indexed keywords

ATOMIC FORCE MICROSCOPY; EVAPORATION; HIGH TEMPERATURE EFFECTS; LATTICE CONSTANTS; MONOLAYERS; NANOSTRUCTURED MATERIALS; REACTION KINETICS; SUBSTRATES; VACUUM APPLICATIONS;

LATTICE MISMATCH; NANORODS; STM; TI SILICIDE; TITIANIUM SILICIDE;

TITANIUM COMPOUNDS;

EID: 5444242746     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.4537     Document Type: Conference Paper

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