Submicron-resolved X-ray topography using asymmetric-reflection magnifiers

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 59, Issue 10-11, 2004, Pages 1549-1555

  Tanuma, R ^a   Ohsawa, M ^a  

^a FUJI ELECTRIC CO   (Japan)

Author keywords

Asymmetric reflection; Spatial resolution; Submicron; Synchrotron radiation; X ray topography

Indexed keywords

CRYSTALS; GEOMETRY; LIGHT REFLECTION; SENSITIVITY ANALYSIS; SILICON WAFERS; SURFACE PROPERTIES; X RAY DIFFRACTION;

ASYMMETRIC REFLECTION; SPATIAL RESOLUTION; SUBMICRON; X-RAY TOPOGRAPHY;

X RAY ANALYSIS;

EID: 5444230822     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2004.03.022     Document Type: Conference Paper

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