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Volumn 205, Issue 8, 2008, Pages 1971-1974
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Effects of surface pretreatment on growth of ZnO on glass substrate
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC LAYER DEPOSITION (ALD;
C -AXIS;
CRYSTALLINE SIZES;
GLASS SUBSTRATES;
HEXAMETHYLDISILAZANE;
INCUBATION PERIODS;
INPLANE;
POLYCRYSTALLINE;
PREFERENTIAL ORIENTATIONS;
PRETREATMENTS;
RANDOM ORIENTATIONS;
SUBSTRATE SURFACES;
SURFACE PRETREATMENT;
ZNO THIN FILMS;
ATOMIC LAYER DEPOSITION;
CRYSTALLINE MATERIALS;
FILM GROWTH;
GLASS;
MAGNETIC FILMS;
MOLECULAR BEAM EPITAXY;
PHYSICAL VAPOR DEPOSITION;
PULSED LASER DEPOSITION;
SEMICONDUCTING ZINC COMPOUNDS;
SUBSTRATES;
THICK FILMS;
THIN FILMS;
ZINC ALLOYS;
ZINC OXIDE;
SURFACE MORPHOLOGY;
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EID: 54249149926
PISSN: 18626300
EISSN: 18626319
Source Type: Journal
DOI: 10.1002/pssa.200778912 Document Type: Conference Paper |
Times cited : (15)
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References (12)
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