Electrical and optical properties of transparent oxide semiconductors (TOSs) based on Eu,Pd- And Tb,Pd-doped TiO 2

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 8, 2008, Pages 1967-1970

  Domaradzki, J ^a   Kaczmarek, D ^a   Borkowska, A ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL CONDUCTIONS; ELECTRICAL PROPERTIES; FUNDAMENTAL ABSORPTION EDGES; GLASS SUBSTRATES; LONGER WAVELENGTHS; MOSAIC TARGETS; NANOCRYSTALLINE STRUCTURES; NONLINEAR; OPTICAL TRANSMISSION MEASUREMENTS; THIN OXIDE FILMS; TRANSPARENT OXIDE SEMICONDUCTORS; XRD STUDIES;

ABSORPTION; CRYSTALS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; EUROPIUM; FILM PREPARATION; HEAT CONDUCTION; HETEROJUNCTIONS; MAGNETRON SPUTTERING; METALLIC COMPOUNDS; METALLIC GLASS; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDE MINERALS; PALLADIUM; PHASE INTERFACES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR MATERIALS; SILICON; SILICON WAFERS; TERBIUM ALLOYS; THICK FILMS; THIN FILMS; TITANIUM; TITANIUM OXIDES;

OPTICAL FILMS;

EID: 54249112851     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200778872     Document Type: Conference Paper

References (19)

1. H. Tuller and R. Mlack, J. Electroceramics 4, 415 (2000).
2. S. Zhang, L. Raniero, E. Fortunato, I. Ferreira, H. Aguas, and R. Martins, Thin Solid Films 487, 268 (2005).
3. K. Tonooka, H. Bando, and Y. Aiura, Thin Solid Films 445, 327 (2003).
4. K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature 432, 488 (2004).
5. P. F. Garcia and R. S. McLean, Transparent Oxide Semi-conductor Thin Films Transistors, PCT U.S. Patent WO 2004/034449 A2, April 22, 2004.
6. J. Henry and J. Livingstone, Int. J. Electron. 88, 1057 (2001).
7. M. Suchea, S. Christoulakis, K. Moschovis, N. Katsarakis, and G. Kiriakidis, Thin Solid Films 515, 551 (2006).
8. T. Kamiya and H. Hosono, Int. J. Appl. Ceram. Technol. 2(4), 285 (2005).
9. J. Domaradzki, J. Non-Cryst. Solids 352(23-25), 2328 (2006).
10. J. Domaradzki, A. Borkowska, D. Kaczmarek, and E. L. Prociow, J. Non-Cryst. Solids 352(23-25), 2324 (2006).
11. R. Kudrawiec, A, Podhorodecki, N. Mirowska, J. Misiewicz, I. S. Molchan, N. V. Gaponenko, A. A. Lutich, and S. V. Gaponenko, Mater. Sci. Eng. B 105, 53 (2003).
12. K. L. Frindell, M. H. Bartl, M. R. Robinson, G. C. Bazan, A. Popitsch, and G. D. Stucky, J. Solid State Chem. 172, 81 (2003).
13. Ch. Jia, E. Xie, A, Peng, R. Jiang, F. Ye, H. Lin, and T. Xu, Thin Solid Films 496, 555 (2006).
14. J. Domaradzki, D. Kaczmarek, E. L. Prociow, A. Borkowska, D. Schmeisser, and G. Beuckert, Thin Solid Films 513(1-2), 269 (2006).
15. R. Wasielewski, J. Domaradzki, D. Wojcieszak, D, Kaczmarek, A. Borkowska, E. L. Prociow, and A. Ciszewski, Appl. Surf. Sci. 254(14), 4396 (2008).
16. J. Domaradzki, Thin Solid Films 497(1-2), 243 (2006).
17. J. Domaradzki, A. Borkowska, and D. Kaczmarek, in: Proceedings of The Sixth International Conference on Advanced Semiconductor Devices and Microsystems, Smolenice Castle, Slovakia, 2006, IEEE 06EX1383, pp. 63-66.
18. B. Karunagaran, S. J. Chung, E.-K. Suh, and D. Mangalaraj, Physica B 369, 129 (2005).
19. Powder Diffraction File, Joint Committee on Powder Diffraction Standards ASTM, Philadelphia, PA, 1967, Card 21-1276.