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Volumn 47, Issue 1 PART 2, 2008, Pages 609-611
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Characterization of Al-based insulating films fabricated by physical vapor deposition
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Author keywords
Al2O3; AlN; Electron beam evaporation; Reactive sputtering; Submount
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Indexed keywords
ALUMINUM;
COPPER;
DISSOLUTION;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
ELECTRON GUNS;
EVAPORATION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FOURIER TRANSFORMS;
INFRARED SPECTROSCOPY;
INSULATING MATERIALS;
MICROSCOPIC EXAMINATION;
MOISTURE;
OPTOELECTRONIC DEVICES;
OXYGEN;
PARTICLE BEAMS;
PLASTIC FILMS;
REACTIVE SPUTTERING;
SPECTROSCOPIC ANALYSIS;
SUBSTRATES;
SURFACE TREATMENT;
THERMAL CONDUCTIVITY;
THERMAL INSULATING MATERIALS;
THERMOANALYSIS;
THERMODYNAMIC PROPERTIES;
THERMOELECTRICITY;
VAPORS;
AFTER-TREATMENT;
AL2O3;
ALKALINE DEVELOPERS;
ALN;
ALN FILMS;
CONDUCTING PATHS;
CONDUCTIVE PATHS;
COPPER SUBSTRATES;
ELECTRICAL MEASUREMENTS;
ELECTRODE PATTERNS;
ELECTRON BEAM EVAPORATION;
FOURIER TRANSFORM INFRARED;
INSULATING FILMS;
PHOTOLITHOGRAPHY PROCESSES;
RF REACTIVE SPUTTERING;
SCANNING ELECTRON MICROSCOPY IMAGES;
SUBMOUNT;
CONDUCTIVE FILMS;
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EID: 54249105031
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.47.609 Document Type: Article |
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Times cited : (3)
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References (9)
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