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Applied Physics Letters

Volumn 93, Issue 15, 2008, Pages

Intrinsic generation of OH groups in dry silicon dioxide upon thermal treatments

(3) Nuccio, Laura a Agnello, Simonpietro a Boscaino, Roberto a

a UNIVERSITY OF PALERMO (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CONCENTRATION (PROCESS); CURING; HEAT TREATMENT; HELIUM; NETWORK PROTOCOLS; SENSOR NETWORKS; THERMAL SPRAYING;

DRY SILICAS; GENERATION MECHANISMS; IR ABSORPTIONS; IR MEASUREMENTS; OH CONCENTRATIONS; OH GROUPS; REACTION PATHS; SILICON DIOXIDES; THERMAL TREATMENTS;

SILICA;

EID: 54149095994 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2998581 Document Type: Article

Times cited : (13)

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