Modification of vacuum-ultraviolet absorption of SiOH groups in SiO2 glass with temperature, F2 laser irradiation, and H-D isotope exchange

Journal of Non-Crystalline Solids

Volumn 352, Issue 23-25, 2006, Pages 2307-2310

  Kajihara, Koichi ^a   Hirano, Masahiro ^a   Skuja, Linards ^b   Hosono, Hideo ^c  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b UNIVERSITY OF LATVIA   (Latvia)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Absorption; Silica

Indexed keywords

ABSORPTION; GROUND STATE; HYDROGEN BONDS; ISOTOPES; LASER BEAM EFFECTS; OXYGEN; PHOTONS; SILICA; THERMAL EFFECTS;

LASER IRRADIATION; VACUUM-ULTRAVIOLET ABSORPTION; ZERO-POINT ENERGY;

GLASS;

EID: 33745656777     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.02.059     Document Type: Article

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