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Volumn 353, Issue 52-54, 2007, Pages 4633-4639

Water diffusion in silica film during silicon wet oxidation

Author keywords

Diffusion and transport; Films and coatings; FTIR measurements; Glasses; Optical spectroscopy; Oxidation; Silica; Silicon; Water in glass

Indexed keywords

DIFFUSION IN LIQUIDS; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FUSED SILICA; HIGH TEMPERATURE EFFECTS; OXIDATION; REACTION KINETICS;

EID: 36549063025     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.07.016     Document Type: Article
Times cited : (13)

References (22)
  • 7
    • 0002884252 scopus 로고
    • Mitchell J.W., DeVries R.C., Robert R.W., and Cannon P. (Eds), Wiley, New York
    • Doremus R.H. In: Mitchell J.W., DeVries R.C., Robert R.W., and Cannon P. (Eds). Reactivity of Solids (1969), Wiley, New York 667
    • (1969) Reactivity of Solids , pp. 667
    • Doremus, R.H.1
  • 8
    • 36549030819 scopus 로고    scopus 로고
    • M. Tomozawa, S.-R. Ryu, in: Proceedings of the XXth ICG, Kyoto, I-70-107, 2004.
  • 10
    • 36549068248 scopus 로고    scopus 로고
    • J.-W. Lee, M. Tomozawa, R.K. MacCrone, Point defect formation and annihilation in silica glass by heat-treatment, J. Non-Cryst. Solids, submitted for publication.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.