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Journal of Materials Science: Materials in Electronics

Volumn 19, Issue SUPPL. 1, 2008, Pages

In situ X-ray diffraction study of epitaxial growth of ordered Fe 3Si films

(6) Jenichen, B a Kaganer, V M a Braun, W a Shayduk, R a Tinkham, B a Herfort, J a

a PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

IN SITU X-RAY DIFFRACTION;

CRYSTAL GROWTH; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR DYNAMICS;

EPITAXIAL GROWTH;

EID: 53649104182 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-007-9530-z Document Type: Article

Times cited : (3)

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