Effect of electrode configuration and mode of deposition on magnetoresistance in electrodeposited Co/Cu multilayers on n-Si by a fully electrochemical method

Electrochimica Acta

Volumn 54, Issue 2, 2008, Pages 430-433

  Pradhan, Debabrata ^a   Sripadmini, Thamminana ^a   Pradhan, Pradeep ^a   Katiyar, M ^a   Shekhar, R ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

Composite pulse; Electrodeposition; Magnetoresistance; Metallic multilayers; Silicon

Indexed keywords

COPPER; ELECTRIC RESISTANCE; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; ELECTROLYSIS; MAGNETIC FIELD EFFECTS; MAGNETOELECTRONICS; MAGNETORESISTANCE; METALLIZING; SILICON;

BACK CONTACTS; CO/CU MULTILAYERS; COMPOSITE PULSE; CONTINUOUS MODE; ELECTRO-CHEMICAL METHOD; ELECTRODE CONFIGURATIONS; ELECTROLESS PLATED; METALLIC LAYERS; METALLIC MULTILAYERS; POTENTIOSTATIC PULSES; PRODUCTION PROCESSES; ROOM TEMPERATURES; VAPOUR DEPOSITION;

MULTILAYERS;

EID: 53649103359     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.07.065     Document Type: Article

References (12)

1. Keefe P.O., Kasyutich O.I., Schwarzacher W., de Oliveira L.S., and Pasa A.A. Appl. Phys. Lett. 73 (1998) 1002
2. Gong J., Butler W.H., and Zangari G. IEEE Trans. Magn. 41 (2005) 3634
3. Ghosh S.K., Grover A.K., Chowdhury P., Gupta S.K., Ravikumar G., Aswal D.K., Kumar M.S., and Dusane R.O. Appl. Phys. Lett. 89 (2006) 132507
4. Seligman L., Sartorelli M.L., Pasa A.A., Schwarzacher W., and Kasyutich O.I. J. Magn. Magn. Mater. 226-230 (2001) 752
5. Pattanaik G.R., Pandya D.K., and Kashyap S.C. J. Electrochem. Soc. 149 (2002) 363
6. Lashmore D.S., and Dariel M.P. J. Electrochem. Soc. 135 (1988) 1218
7. Bakonyi I., Toth J., Goualou L., Becsei T., Toth-Kadar E., Schwarzacher W., and Nabiyouni G. J. Electrochem. Soc. 149 (2002) C195
8. Weihnact V., Peter L., Toth J., Padar J., Zs Kerner, Schneider C.M., and Bakonyi I. J. Electrochem. Soc. 150 (2003) C507
9. T. Sripadmini, Electrodeposition of Co/Cu magnetic multilayers on n-Si (100), M.Tech. Thesis, Indian Institute of Technology, Kanpur, India, 2005.
10. P. Pradhan, Pulse electrodeposition of Co/Cu multilayers on Si (100) for giant magnetoresistance, M.Tech. Thesis, Indian Institute of Technology, Kanpur, India, 2006.
11. Peter L., Liu Q., Kerner Z., and Bakonyi I. Electrochim. Acta 49 (2004) 1513
12. Bakonyi I., Peter L., Rolik Z., Kiss-Szabo K., Kupay Z., Toth J., Kiss L.F., and Padar J. Phys. Rev. B 70 (2004) 054427