Optimization of magnetoresistive sensitivity in electrodeposited FeCoNi/Cu multilayers

IEEE Transactions on Magnetics

Volumn 41, Issue 10, 2005, Pages 3634-3636

  Gong, Jie ^a   Butler, William H ^a   Zangari, Giovanni ^b  

^a UNIVERSITY OF ALABAMA   (United States)

^b University of Virginia   (United States)

Author keywords

Electrodeposition; FeCoNi Cu; Magnetic multilayers; Magnetoresistive sensitivity

Indexed keywords

COERCIVE FORCE; DISSOLUTION; ELECTRODEPOSITION; ELECTROLYTES; IRON COMPOUNDS; MAGNETORESISTANCE; OPTIMIZATION; SENSITIVITY ANALYSIS; SENSORS; SILICON;

FECONI/CU; MAGNETIC MULTILAYERS; MAGNETORESISTIVE SENSITIVITY; SUBLAYER DEPOSITION;

MULTILAYERS;

EID: 27744435074     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2005.855170     Document Type: Article

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