Low-Temperature OMCVD of InN Thin Films from the Novel Air-Stable Single-Molecule Precursor Azido{bis[(3-dimethylamino)propyl]}indium, (N3)In[(CH2)3NMe2]2

Chemistry of Materials

Volumn 8, Issue 7, 1996, Pages 1356-1359

  Fischer, Roland A ^a,c   Miehr, Alexander ^a   Metzger, Thomas ^a   Born, Eberhard ^a   Ambacher, Oliver ^b   Angerer, Helmut ^b   Dimitrov, Roman ^b  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b WALTER SCHOTTKY INSTITUT   (Germany)

^c UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039152027     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9600642     Document Type: Article

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