Carbon clusters in N-doped ZnO by metal-organic chemical vapor deposition

Applied Physics Letters

Volumn 93, Issue 13, 2008, Pages

  Tang, Kun ^a   Gu, Shulin ^a   Zhu, Shunming ^a   Liu, Wei ^a   Ye, Jiandong ^a   Zhu, Jianmin ^a   Zhang, Rong ^a   Zheng, Youdou ^a   Sun, Xiaowei ^b  

^a NANJING UNIVERSITY   (China)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CRYSTAL GROWTH; DESORPTION; GRAIN BOUNDARIES; GRAPHITE; HYDROCARBONS; INDUSTRIAL CHEMICALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSCOPIC EXAMINATION; NANOSTRUCTURES; ORGANIC CARBON; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; OXYGEN; SEMICONDUCTING ZINC COMPOUNDS; VAPORS; ZINC ALLOYS; ZINC OXIDE;

CARBON IMPURITIES; CARBON INCORPORATION; DESORPTION RATES; DOPED CARBONS; FORMATION MECHANISMS; HIGH TEMPERATURE; HYDROCARBON RADICALS; METAL-ORGANIC CHEMICAL VAPOR DEPOSITION; N-DOPED; OXYGEN ATOMS; P TYPE CONDUCTIVITIES; RAMAN SPECTRUM; TRANSMISSION ELECTRON;

CARBON CLUSTERS;

EID: 53349120755     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2992197     Document Type: Article

References (14)

1. S. T. Tan, X. W. Sun, Z. G. Yu, P. Wu, G. Q. Lo, and D. L. Kwong, Appl. Phys. Lett. 91, 072101 (2007).
2. X. Li, S. E. Asher, S. Limpijumnong, S. B. Zhang, S.-H. Wei, T. M. Barnes, T. J. Coutts, and R. Noufi, J. Vac. Sci. Technol. A 24, 1213 (2006).
3. S. Limpijumnong, X. Li, S.-H. Wei, and S. B. Zhang, Appl. Phys. Lett. 86, 211910 (2005).
4. S. Gangil, A. Nakamura, Y. Ichikawa, K. Yamamoto, J. Ishihara, T. Aoki, and J. Temmyo, J. Cryst. Growth 298, 486 (2007).
5. N. H. Nickel, F. Friedrich, J. F. Rommelùre, and P. Galtier, Appl. Phys. Lett. 87, 211905 (2005).
6. Lei L. Kerr, X. Li, M. Canepa, and A. J. Sommer, Thin Solid Films 515, 5282 (2007).
7. W. Liu, S. L. Gu, J. D. Ye, S. M. Zhu, Y. X. Wu, Z. P. Shan, R. Zhang, Y. D. Zhen, S. F. Choy, G. Q. Lo, and X. W. Sun, J. Cryst. Growth 310, 3448 (2008).
8. S. M. Liu, S. L. Gu, J. D. Ye, S. M. Zhu, W. Liu, K. Tang, Z. P. Shan, R. Zhang, Y. D. Zheng, and X. W. Sun, Appl. Phys. A: Mater. Sci. Process. 91, 535 (2008).
9. A. Kaschner, U. Haboeck, M. Strassburg, M. Strassburg, G. Kaczmarczyk, A. Hoffmann, C. Thomsen, A. Zeuner, H. R. Alves, D. M. Hofmann, and B. K. Meyer, Appl. Phys. Lett. 80, 1909 (2002).
10. F. J. Manjón, B. Marí, J. Serrano, and A. H. Romero, J. Appl. Phys. 97, 053516 (2005).
11. G. B. Stringfellow, Organicometallic Vapor-phase Epitaxy (Academic, New York, 1998), p. 319.
12. Q. Wang, Q. Sun, P. Jena, and Y. Kawazoe, Phys. Rev. B 70, 052408 (2004).
13. A. C. Ferrari and J. Robertson, Phys. Rev. B 61, 14095 (2000).
14. D. C. Look, Semicond. Sci. Technol. 20, S55 (2005).