Low-temperature preparation and characterization of iron-ion doped titania thin films

Journal of Hazardous Materials

Volumn 159, Issue 2-3, 2008, Pages 636-639

  Lu, Chung Hsin ^a   Hu, Chi Yuan ^a   Wu, Chung Hsien ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

High pressure; Iron; Photocatalytic; Thin films; Titania

Indexed keywords

CRYSTALLIZATION; METALLIC GLASS; NANOCRYSTALLINE ALLOYS; THICK FILMS; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES;

HIGH PRESSURE; IRON; PHOTOCATALYTIC; TITANIA;

FILM PREPARATION;

IRON; TITANIUM DIOXIDE;

CATALYSIS; CATION; CRYSTALLIZATION; HIGH PRESSURE; IRON; LOW TEMPERATURE; MICROSTRUCTURE; TITANIUM;

ARTICLE; CRYSTALLIZATION; LOW TEMPERATURE; PHOTOCATALYSIS; SYNTHESIS; X RAY DIFFRACTION;

CATALYSIS; CRYSTALLIZATION; IRON; LIGHT; MICROSCOPY, ELECTRON, SCANNING; PRESSURE; SPECTROPHOTOMETRY, ULTRAVIOLET; SURFACE PROPERTIES; TEMPERATURE; TITANIUM; X-RAY DIFFRACTION;

EID: 53149141059     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2008.02.050     Document Type: Article

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