Growth control of carbon nanotubes by plasma enhanced chemical vapor deposition

Vacuum

Volumn 83, Issue 3, 2008, Pages 515-517

  Sato, Hideki ^a   Sakai, Takamichi ^a   Suzuki, Atsushi ^a   Kajiwara, Kazuo ^a   Hata, Koichi ^a   Saito, Yahachi ^b  

^a MIE UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Carbon nanotubes; Catalyst; Field emitter; Nanoparticles; Plasma enhanced chemical vapor deposition

Indexed keywords

CARBON NANOTUBES; CATALYSIS; ECOLOGY; ELECTRONICS ENGINEERING; FIELD EMISSION; FIELD EMISSION DISPLAYS; FILM GROWTH; MICROELECTROMECHANICAL DEVICES; NANOCOMPOSITES; NANOELECTRONICS; NANOPORES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTECHNOLOGY; NANOTUBES; PLASMA DEPOSITION; PLASMAS; SILICON SOLAR CELLS; SUBSTRATES; THICK FILMS; VAPORS;

APPLICATIONS.; CATALYST; CATALYST NANOPARTICLES; FIELD EMITTER; GROWTH CHARACTERISTICS; GROWTH CONTROL; GROWTH PROCESSES; HIGH-EFFICIENCY; NANOPARTICLES; PRE TREATMENTS; RADIO FREQUENCY PECVD; RF-PECVD; SOLID SUBSTRATE; VERTICALLY ALIGNED CARBON NANOTUBES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 52949152406     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.04.017     Document Type: Article

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