Vertically aligned carbon nanotubes grown by plasma enhanced chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2564-2568

  Sato, Hideki ^a   Takegawa, Hitoshi ^a   Saito, Yahachi ^a  

^a MIE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST ACTIVITY; DENSITY (SPECIFIC GRAVITY); FIELD EMISSION DISPLAYS; GRAPHITE; GROWTH (MATERIALS); ION BOMBARDMENT; IRRADIATION; LOW TEMPERATURE EFFECTS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE PHENOMENA; THICKNESS MEASUREMENT; VACUUM DEPOSITED COATINGS; VAPORIZATION;

CATALYST FILMS; MASS FLOW CONTROLLERS; PLASMA TREATMENT;

CARBON NANOTUBES;

EID: 0942289263     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1627332     Document Type: Article

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