Synthesis and characterizations of positive-working photosensitive polyimides having 4,5-dimethoxy-o-nitrobenzyl side group

Bulletin of the Korean Chemical Society

Volumn 29, Issue 9, 2008, Pages 1689-1694

  Ryu, Sun ^a   Jong, Hoon Kim ^a   Seung, Hee Lee ^a   Lee, Myong Hoon ^a  

^a Chonbuk National University   (South Korea)

Author keywords

o nitrobenzyl; Photoresist; Photosensitive; Polyimides; Positive working

Indexed keywords

ALKALINITY; CARBOXYLIC ACIDS; DIFFERENTIAL SCANNING CALORIMETRY; ORGANIC POLYMERS; PHOTOPOLYMERS; PHOTORESISTS; PHOTOSENSITIVITY; POLYIMIDES; POLYMERS; THERMOGRAVIMETRIC ANALYSIS; ULTRAVIOLET VISIBLE SPECTROSCOPY;

CARBOXYLIC ACID GROUPS; PHOTO-SENSITIVE POLYIMIDE; PHOTOSENSITIVE; PHOTOSENSITIVE GROUPS; POSITIVE-WORKING; SYNTHESIS AND CHARACTERIZATIONS; SYNTHESIZED POLYMERS; UV/ VIS SPECTROSCOPY;

LIGHT SENSITIVE MATERIALS;

EID: 52749083971     PISSN: 02532964     EISSN: 12295949     Source Type: Journal    
DOI: 10.5012/bkcs.2008.29.9.1689     Document Type: Article

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