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Volumn 26, Issue 6, 2002, Pages 701-709

Synthesis and characterization of new positive photosensitive polyimide having photocleavable 4,5-dimethoxy-2-nitrobenzyl (DMNB) groups

Author keywords

Micro lithography; Photosensitive polymer; Poly imide co (amic ester) ; Polyimides; Positive type

Indexed keywords


EID: 24344508192     PISSN: 0379153X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (5)

References (19)
  • 18
    • 24344475258 scopus 로고    scopus 로고
    • US Pat. Appl. 08/558,597 (1995). JP Appl. 95-283268 (1995). KP Appl. 94-28242 (1994)
    • M.-H. Lee, J. Park, and S. B. Rhee, US Pat. Appl. 08/558,597 (1995). JP Appl. 95-283268 (1995). KP Appl. 94-28242 (1994).
    • Lee, M.-H.1    Park, J.2    Rhee, S.B.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.