Lithographic design of photosensitive polyarylates based on reaction development patterning

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 44, Issue 8, 2006, Pages 2694-2706

  Oyama, Toshiyuki ^a   Kitamura, Akira ^a   Sato, Eiichi ^a   Tomoi, Masao ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

High performance polymers; Photoresists; Polyarylates; Reaction development patterning (RDP); Structure property relations; Substituent (R) in the bisphenol moieties

Indexed keywords

LITHOGRAPHY; PHENOLS; PHOTORESISTS; PHOTOSENSITIVITY; PRODUCT DESIGN; REACTION KINETICS;

HIGH PERFORMANCE POLYMERS; REACTION DEVELOPMENT PATTERNING (RDP); STRUCTURE PROPERTY RELATIONS; SUBSTITUENT IN THE BISPHENOL MOIETIES;

POLYACRYLATES;

EID: 33646166566     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.21386     Document Type: Article

References (20)

1. Polymers for Microelectronics and Nanoelectronics; Lin, Q.; Pearson, R. A.; Hedrick, J. C., Eds.; ACS Symposium Series 874; American Chemical Society: Washington, DC, 2004.
2. Micro- and Nanopatterning Polymers; Ito, H.; Reichmanis, E.; Nalamasu, O.; Ueno, T., Eds.; ACS Symposium Series 706; American Chemical Society: Washington, DC, 1998.
3. Dammel, R. Diazonaphthoquinone-Based Resists; SPIE: Bellingham, WA, 1993.
4. Reiser, A.; Shih, H. Y.; Yeh, T. F.; Huang, J. P. Angew Chem Int Ed Engl 1996, 35, 2428.
5. Ito, H. In Radiation Curing in Polymer Science and Technology Polymer Science and Technology; Fouassier, J. P.; Rabek, J. F., Eds.; Elsevier: Amsterdam, 1993; Vol. 4, Chapter 11, pp 237-359.
6. Omote, T. InPhotosensitive Polyimides: Fundamentals and Applications; Ghosh, M. K.; Mittal, K. L., Eds.; Marcel Dekker: New York, 1996; pp 121-149.
7. Bureau, J.-M.; Droguet, J.-P. In Photosensitive Polyimides: Fundamentals and Applications; Ghosh, M. K.; Mittal, K. L., Eds.; Marcel Dekker: New York, 1996; pp 743-757.
8. Photosensitive Polyimides: Fundamentals and Applications; Horie, K.; Yamashita, T., Eds.; Technomic: Lancaster, PA, 1995.
9. Fukushima, T.; Oyama, T.; Iijima, T.; Tomoi, M.; Itatani, H. J Polym Sci Part A: Polym Chem 2001, 39, 3451.
10. Miyagawa, T.; Fukushima, T.; Oyama, T.; Iijima, T.; Tomoi, M. J Polym Sci Part A: Polym Chem 2003, 41, 861.
11. Fukushima, T.; Kawakami, Y.; Kitamura, A.; Oyama, T.; Tomoi, M. J Microlith Microfab Microsyst 2004, 3, 159.
12. Oyama, T.; Kawakami, Y.; Fukushima, T.; Iijima, T.; Tomoi, M. Polym Bull 2001, 47, 175.
13. Fukushima, T.; Kawakami, Y.; Oyama, T.; Iijima, T.; Tomoi, M. J Photopolym Sci Technol 2002, 15, 191.
14. Oyama, T.; Kitamura, A.; Fukushima, T.; Iijima, T.; Tomoi, M. Macromol Rapid Commun 2002, 23, 104.
15. Yoneyama, M.; Kuruppu, K. D. A.; Kakimoto, M.; Imai, Y. J Polym Sci Part A: Polym Chem 1989, 27, 979.
16. Morgan, P. W. J Polym Sci Part A: Gen Pap 1964, 2, 437.
17. Fukuoka, T.; Tatehata, H.; Mochizuki, A. J Appl Polym Sci 2001, 80, 1687.
18. Wang, X.; Yu, J.; Wang, Y.; Wang, L. Chemosphere 2002, 46, 241.
19. Takayanagi, T.; Motomizu, S. Chem Lett 2001, +14.
20. Underwood, H. W.; Barker, G. E. J Am Chem Soc 1930, 52, 4082.