Spectroscopic ellipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 5, 2008, Pages 1253-1256

  Marsik, P ^a,e   Verdonck, P ^a   Schneider, D ^b   De Roest, D ^c   Kaneko, S ^d   Baklanov, M R ^a  

^a IMEC   (Belgium)

^b FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^c ASM BELGIUM   (Belgium)

^d ASM Japan   (Japan)

^e MASARYK UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CURED MATERIALS; CURING TIME; DIELECTRIC FUNCTIONS; ELLIPSOMETRIC POROSIMETRY; FTIR; HYDROGEN INCORPORATION; K-VALUE; LASER INDUCED; LOW-K DIELECTRIC FILMS; LOW-K FILMS; POROGENS; POROUS LOW-K; SURFACE ACOUSTIC WAVE MEASUREMENTS; UV-CURING;

ACOUSTIC SURFACE WAVE DEVICES; ACOUSTIC WAVES; ACOUSTICS; CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MECHANICAL PROPERTIES; OPTICAL PROPERTIES; PORE SIZE; SPECTROSCOPIC ELLIPSOMETRY;

CURING;

EID: 52649170402     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200777742     Document Type: Conference Paper

References (7)

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