AIPO4-18 seed layers and films by secondary growth

Chemistry of Materials

Volumn 20, Issue 17, 2008, Pages 5721-5726

  Tosheva, Lubomira ^a   Ng, Eng Poh ^b   Mintova, Svetlana ^b   Hölzl, Manfred ^c   Metzger, Till H ^d   Doyle, Aidan M ^a  

^a MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^b UNIVERSITÉ DE HAUTE ALSACE   (France)

^c WACKER CHEMIE AG   (Germany)

^d EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 52649117577     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm801238w     Document Type: Article

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