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Volumn 3, Issue , 2008, Pages 266-269
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Silicon oxynitride based photonics
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Author keywords
Annealing; Chemical vapor deposition; Hydrogen reduction; Integrated optical devices; Silicon nitride; Silicon oxynitride
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Indexed keywords
HYDROGEN;
INTEGRATED CIRCUITS;
INTEGRATED OPTICS;
NITRIDES;
NONMETALS;
OPTICAL PROPERTIES;
PHOTONICS;
REFRACTIVE INDEX;
SEMICONDUCTING CADMIUM TELLURIDE;
SILICON;
ANNEALING;
APPLICATION EXAMPLES;
CHEMICAL VAPOR DEPOSITION;
HYDROGEN INCORPORATION;
HYDROGEN REDUCTION;
INTEGRATED OPTICAL DEVICES;
INTERNATIONAL CONFERENCES;
MATERIAL COMPOSITIONS;
NOVEL PROCESSES;
REFRACTIVE INDICES;
SILICON NITRIDE;
SILICON OXYNITRIDE;
TRANSPARENT OPTICAL NETWORKS;
OPTICAL MATERIALS;
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EID: 52149103763
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ICTON.2008.4598706 Document Type: Conference Paper |
Times cited : (24)
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References (11)
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