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Volumn 3, Issue , 2008, Pages 266-269

Silicon oxynitride based photonics

Author keywords

Annealing; Chemical vapor deposition; Hydrogen reduction; Integrated optical devices; Silicon nitride; Silicon oxynitride

Indexed keywords

HYDROGEN; INTEGRATED CIRCUITS; INTEGRATED OPTICS; NITRIDES; NONMETALS; OPTICAL PROPERTIES; PHOTONICS; REFRACTIVE INDEX; SEMICONDUCTING CADMIUM TELLURIDE; SILICON;

EID: 52149103763     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICTON.2008.4598706     Document Type: Conference Paper
Times cited : (24)

References (11)
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  • 2
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    • Hoffmann, M.1
  • 4
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  • 5
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  • 6
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    • Single-chip ring resonator-based 1 × 8 optical beam forming network in CMOS-compatible waveguide technology
    • L. Zhuang, et al.: Single-chip ring resonator-based 1 × 8 optical beam forming network in CMOS-compatible waveguide technology, IEEE Photon. Technol. Lett., vol. 19, pp. 1130-1132, 2007.
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  • 9
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    • Densely integrated microring resonator based photonic devices for use in access networks
    • E. J. Klein, et al.: Densely integrated microring resonator based photonic devices for use in access networks, Optics Express, vol. 15, pp. 10346-10355, 2007.
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  • 10
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    • Plasma enhanced chemical vapor deposition of silicon oxynitride optimized for application in integrated optics
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    • G.M. Hussein, et al.: Reduction of hydrogen-induced optical losses of plasma-enhanced chemical vapour deposition silicon oxynitride by phosphorus doping and heat treatment, J. Appl. Phys., vol. 101, pp. 23517 (6), 2007.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.