Reduction of hydrogen-induced optical losses of plasma-enhanced chemical vapor deposition silicon oxynitride by phosphorus doping and heat treatment

Journal of Applied Physics

Volumn 101, Issue 2, 2007, Pages

  Hussein, M G ^a   Worhoff K ^a   Sengo, G ^a   Driessen, A ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DOPING (ADDITIVES); FOURIER TRANSFORM INFRARED SPECTROSCOPY; OPTICAL LOSSES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; X RAY PHOTOELECTRON SPECTROSCOPY;

GASEOUS MIXTURES; PHOSPHORUS CONCENTRATION; PHOSPHORUS DOPING; SILICON OXYNITRIDE;

SILICON COMPOUNDS;

EID: 33847763244     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2423219     Document Type: Article

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