Modeling titanium oxide growth by chemical vapor deposition using titanium tetra isopropoxide

Journal of Chemical Engineering of Japan

Volumn 41, Issue 8, 2008, Pages 779-784

  Akiyama, Yasunobu ^a   Shitanaka, Katsuya ^a   Murakami, Hiroshi ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

CVD; Growth rate; Reaction model; Step coverage; Titanium oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; TITANIUM;

CHEMICAL VAPORS; CVD; GROWTH RATE; OXIDE GROWTH; REACTION MODEL; STEP COVERAGE; TITANIUM OXIDE; TITANIUM TETRA-ISOPROPOXIDE;

TITANIUM OXIDES;

EID: 52049098515     PISSN: 00219592     EISSN: None     Source Type: Journal    
DOI: 10.1252/jcej.07WE118     Document Type: Article

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