-
1
-
-
20044394166
-
A Review of Laser Induced Techniques for Microelectronic Failure Analysis
-
Jul 04, Hsinchu, Taiwan
-
Phang JCH, Chan DSH, Palaniappan M, Chin JM, Davis B, Bruce M, Wilcox J, Gilfeather G, Chua CM, Koh LS, Ng HY, Tan SH, "A Review of Laser Induced Techniques for Microelectronic Failure Analysis", Proc Int Symp Physical & Failure Analysis of Integrated Circuits (IPFA 2004), 5-8 Jul 04, Hsinchu, Taiwan, pg 255-261, 2004.
-
(2004)
Proc Int Symp Physical & Failure Analysis of Integrated Circuits (IPFA 2004), 5-8
, pp. 255-261
-
-
Phang, J.C.H.1
Chan, D.S.H.2
Palaniappan, M.3
Chin, J.M.4
Davis, B.5
Bruce, M.6
Wilcox, J.7
Gilfeather, G.8
Chua, C.M.9
Koh, L.S.10
Ng, H.Y.11
Tan, S.H.12
-
2
-
-
0013227588
-
Optical Adsorption Measurements of Band-gap Shrinkage in Moderately and Heavily Doped Silicon
-
Aw SE, Tan HS, Ong CK, "Optical Adsorption Measurements of Band-gap Shrinkage in Moderately and Heavily Doped Silicon", J Phys: Condens Matter, Vol 3, No 42, pg 8213-8223, 1991.
-
(1991)
J Phys: Condens Matter
, vol.3
, Issue.42
, pp. 8213-8223
-
-
Aw, S.E.1
Tan, H.S.2
Ong, C.K.3
-
3
-
-
0001735451
-
Solid Immersion Microscope
-
Mansfield SM, Kino GS, "Solid Immersion Microscope", Appl Phys Lett, Vol 57, No 24, pg 2615-2616, 1990.
-
(1990)
Appl Phys Lett
, vol.57
, Issue.24
, pp. 2615-2616
-
-
Mansfield, S.M.1
Kino, G.S.2
-
4
-
-
1542330661
-
Liquid Immersion Objective for High-Resolution Optical Probing of Advanced Microprocessors
-
Nov 01, Santa Clara, California, USA
-
Eiles T, Pardy P, "Liquid Immersion Objective for High-Resolution Optical Probing of Advanced Microprocessors", Proc Int Symp Testing & Failure Analysis (ISTFA 2001), 11-15 Nov 01, Santa Clara, California, USA, pg 167-170, 2001.
-
(2001)
Proc Int Symp Testing & Failure Analysis (ISTFA 2001), 11-15
, pp. 167-170
-
-
Eiles, T.1
Pardy, P.2
-
5
-
-
33645663585
-
Diffractive Lenses for High Resolution Laser Based Failure Analysis
-
Nov 05, San Jose, California, USA
-
Zachariasse F, Goossens M, "Diffractive Lenses for High Resolution Laser Based Failure Analysis", Proc Int Symp Testing & Failure Analysis (ISTFA 2005), 6-10 Nov 05, San Jose, California, USA, pg 1-7, 2005.
-
(2005)
Proc Int Symp Testing & Failure Analysis (ISTFA 2005), 6-10
, pp. 1-7
-
-
Zachariasse, F.1
Goossens, M.2
-
6
-
-
20444498219
-
-
Ippolito SB, Goldberg BB, Uenlue MS, Theoretical Analysis of Numerical Aperture Increasing Lens Microscopy, J Appl Phys, 97, 053105-1-12, 2005.
-
Ippolito SB, Goldberg BB, Uenlue MS, "Theoretical Analysis of Numerical Aperture Increasing Lens Microscopy", J Appl Phys, Vol 97, pg 053105-1-12, 2005.
-
-
-
-
7
-
-
33645691680
-
The Effectiveness of OBIRCH Based Fault Isolation for Sub-90nm CMOS Technologies
-
Nov 05, San Jose, California, USA
-
de la Bardonnie M, Ross R, Ly K, Lorut F, Lamy M, Wyon C, Kwakman LFTz, "The Effectiveness of OBIRCH Based Fault Isolation for Sub-90nm CMOS Technologies", Proc Int Symp Testing & Failure Analysis (ISTFA 2005), 6-10 Nov 05, San Jose, California, USA, pg 49-58, 2005.
-
(2005)
Proc Int Symp Testing & Failure Analysis (ISTFA 2005), 6-10
, pp. 49-58
-
-
de la Bardonnie, M.1
Ross, R.2
Ly, K.3
Lorut, F.4
Lamy, M.5
Wyon, C.6
Kwakman, L.F.T.7
-
8
-
-
0017538304
-
Optical Constants of Various Heavily Doped pand n-type Silicon Crystals Obtained by Kramers-Krong Analysis
-
Barta E, "Optical Constants of Various Heavily Doped pand n-type Silicon Crystals Obtained by Kramers-Krong Analysis", Infrared Physics, Vol 17, pg 319-329, 1977.
-
(1977)
Infrared Physics
, vol.17
, pp. 319-329
-
-
Barta, E.1
-
9
-
-
0035948103
-
High spatial resolution subsurface microscopy
-
Ippolito SB, Goldberg BB, Ünlü MS, "High spatial resolution subsurface microscopy", Appl Phys Lett, Vol 78, No 26, pg 4071-4073, 2001.
-
(2001)
Appl Phys Lett
, vol.78
, Issue.26
, pp. 4071-4073
-
-
Ippolito, S.B.1
Goldberg, B.B.2
Ünlü, M.S.3
-
10
-
-
51949089640
-
-
Mitutoyo Corporation, Microscope Units, Objectives, Eyepieces and Accessories, Catalog No E4191-378
-
Mitutoyo Corporation, "Microscope Units, Objectives, Eyepieces and Accessories", Catalog No E4191-378
-
-
-
-
11
-
-
14844294322
-
High Resolution Backside Fault Isolation Technique Using Directly Forming Si Substrate into Solid Immersion Lens
-
30 Mar 03-4 Apr 03, Dallas, Texas, USA
-
Koyama T, Yoshida E, Komori J, Mashiko Y, Nakasuji T, Katoh H, "High Resolution Backside Fault Isolation Technique Using Directly Forming Si Substrate into Solid Immersion Lens", Proc Int Rel Phys Symp (IRPS 2003), 30 Mar 03-4 Apr 03, Dallas, Texas, USA, pg 529-535, 2003.
-
(2003)
Proc Int Rel Phys Symp (IRPS
, pp. 529-535
-
-
Koyama, T.1
Yoshida, E.2
Komori, J.3
Mashiko, Y.4
Nakasuji, T.5
Katoh, H.6
|