Effect of H 2 and O 2 plasma etching treatment on the surface of diamond-like carbon thin film

Applied Surface Science

Volumn 254, Issue 23, 2008, Pages 7925-7928

  Yun, Deok Yong ^a   Choi, Won Seok ^b   Park, Yong Seob ^a   Hong, Byungyou ^a  

^a Sungkyunkwan University   (South Korea)

^b Hanbat National University   (South Korea)

Author keywords

Diamond like carbon; Hydrophilic; Plasma etching; Surface treatment

Indexed keywords

CARBON FILMS; DIAMONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROPHILICITY; MEDICAL APPLICATIONS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SURFACE ROUGHNESS; SURFACE TREATMENT; THIN FILMS;

BIOMEDICAL APPLICATIONS; DIAMOND LIKE CARBON; DIAMOND-LIKE CARBON THIN FILMS; FOURIER TRANSFORM INFRA RED (FTIR) SPECTROSCOPY; HYDROPHILIC; OPTIMUM CONDITIONS; PLASMA ETCHING TREATMENTS; THROUGH POWER;

DIAMOND LIKE CARBON FILMS;

EID: 51249086439     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.03.170     Document Type: Article

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