Sputter deposition of silicon oxynitride gradient and multilayer coatings

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Weber, Jörn ^a   Bartzsch, Hagen ^a   Frach, Peter ^a  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DEPOSITION; ENERGY GAP; FILM PREPARATION; NITRIDES; OPTICAL BAND GAPS; SILICON; SILICON NITRIDE; THIN FILMS;

ABSORPTION CHARACTERISTICS; DEPOSITION PROPERTIES; EXTINCTION COEFFICIENTS; MAGNETRON SPUTTERED FILMS; MULTI-LAYER-COATING; SILICON NITRIDE THIN FILMS; SILICON OXYNITRIDE FILMS; SILICON OXYNITRIDE LAYERS;

OPTICAL PROPERTIES;

EID: 50849143188     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C288     Document Type: Article

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