Comparison of production techniques for silicon oxynitride rugates and their effect on laser damage thresholds

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3578, Issue , 1999, Pages 179-187

  Lewis, K L ^a   Blacker, R ^a   Corbett, M ^a   Gurtman, G ^a   Wilson, R ^a  

^a Agency   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC DEVICES; LASER DAMAGE; MAGNETRON SPUTTERING; MIRRORS; MORPHOLOGY; OPTICAL COATINGS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; Q SWITCHED LASERS; REFRACTIVE INDEX; SILICON COMPOUNDS; SOLID STATE LASERS; SPUTTER DEPOSITION;

ION ASSISTED DEPOSITION; SILICON OXYNITRIDE MIRRORS;

OPTICAL MATERIALS;

EID: 0032689295     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.344452     Document Type: Conference Paper

References (5)