Elemental distribution and morphological analysis of layered metallic systems: Application to Co-Sn evaporated multilayers

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8453-8461

  Chiolerio, Alessandro ^a   Chiodoni, Angelica ^a   Allia, Paolo ^a  

^a POLITECNICO DI TORINO   (Italy)

Author keywords

Energy dispersive X ray microscopy; Evaporation; Field emission microscopy; Multilayers; Numerical methods; Surface morphology

Indexed keywords

ATOMIC SPECTROSCOPY; COBALT COMPOUNDS; CORRELATION METHODS; COST EFFECTIVENESS; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM PREPARATION; IMAGING TECHNIQUES; INDUSTRIAL APPLICATIONS; METALS; NUMERICAL METHODS; THERMAL EVAPORATION; THICK FILMS; TIN; TIN ALLOYS;

ATOMIC SPECIES; ELEMENTAL DISTRIBUTIONS; ENERGY DISPERSIVE X-RAY MICROSCOPY; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; EVAPORATION; EXPERIMENTAL DEPOSITION; FIELD EFFECTS; FIELD EMISSION MICROSCOPY; FM LAYERS; METALLIC SYSTEMS; METALLIC THIN FILMS; MORPHOLOGICAL ANALYSIS; MORPHOLOGICAL CHARACTERIZATION; MULTILAYERS; NON-MAGNETIC; NUMERICAL PROCEDURES; PHOTON SCATTERING; PHYSICAL SIMULATIONS; PSEUDO SPIN-VALVE; SURFACE MORPHOLOGY;

COBALT;

EID: 50849097226     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.085     Document Type: Article

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