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Volumn 202, Issue 24, 2008, Pages 6049-6053

Dielectric barrier discharge assisted chemical vapor deposition of boron nitride phosphide films on a quartz substrate

Author keywords

Boron nitride phosphide (BNP); Chemical vapor deopsition (CVD); Dielectric barrier discharge (DBD); Transmission electron microscopy (TEM); UV detector

Indexed keywords

ABSORPTION; BORON; CHEMICAL VAPOR DEPOSITION; DIELECTRIC DEVICES; DISCHARGE (FLUID MECHANICS); FLOW CONTROL; NITRIDES; NONMETALS; OXIDE MINERALS; PLASMAS; QUARTZ; VAPORS;

EID: 50449085367     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.07.002     Document Type: Article
Times cited : (3)

References (14)
  • 11
    • 0001401375 scopus 로고
    • Discharge parameters and chemistry
    • Auciello O., and Flamm D.L. (Eds), Academic Press Chapter 3
    • Hershkowitz N. Discharge parameters and chemistry. In: Auciello O., and Flamm D.L. (Eds). Plasma Diagnostics vol. 1 (1989), Academic Press Chapter 3
    • (1989) Plasma Diagnostics , vol.1
    • Hershkowitz, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.