Boron nitride phosphide thin films grown on quartz substrate by hot-filament and plasma-assisted chemical vapor deposition

Physica Status Solidi (A) Applied Research

Volumn 201, Issue 13, 2004, Pages 2922-2928

  Zhang, X W ^a   Xu, S Y ^a   Han, G R ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; BORON COMPOUNDS; COMPOSITION; CRYSTALLIZATION; FILM GROWTH; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUARTZ; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM-DEPOSITION PROCESS; HIGH ULTRAVIOLET PHOTOELECTRIC SENSITIVITY; HOT FILAMENT; QUARTZ SUBSTRATES;

THIN FILMS;

EID: 19644391541     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200406845     Document Type: Article

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