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Volumn , Issue , 2007, Pages 687-690
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High throughput cell electroporation array fabricated by single-mask inclined UV lithography exposure and oxygen plasma etching
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Author keywords
And oxygen plasma etching; Electroporation; Inclined lithography
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Indexed keywords
ACTUATORS;
ELECTRON BEAM LITHOGRAPHY;
MICROSYSTEMS;
NONMETALS;
OPTICAL DESIGN;
ORIFICES;
OXYGEN;
PLASMA ETCHING;
PLASMAS;
SENSORS;
THROUGHPUT;
TRANSDUCERS;
AND OXYGEN PLASMA ETCHING;
CELL ELECTROPORATION;
CELL TREATMENT;
ELECTROPORATION;
EMBEDDED NETWORKS;
HIGH THROUGHPUTS;
HIGH-DENSITY;
INCLINED LITHOGRAPHY;
INTERNATIONAL CONFERENCES;
LIVING CELLS;
MICRO CHANNELS;
MICRO-ORIFICES;
OXYGEN PLASMA ETCHING;
SOLID-STATE SENSORS;
UV-LITHOGRAPHY;
ETCHING;
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EID: 50049132616
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/SENSOR.2007.4300223 Document Type: Conference Paper |
Times cited : (13)
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References (7)
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