Atomic layer deposition of Al2O3, TiO2 and ZnO films into high aspect ratio pores

TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2007, Pages 521-524

  Sirvio S ^a   Sainiemi, L ^a   Franssila, S ^a   Grigoras, K ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

ALD; Aluminium oxide; Anodic alumina; Micropores; Nanopores; Porous silicon; Titanium dioxide; Zinc oxide

Indexed keywords

ACTUATORS; ALUMINA; ALUMINUM; ALUMINUM CLADDING; ASPECT RATIO; ATOMIC PHYSICS; ATOMS; FLUID MECHANICS; LIGHT METALS; MICROSYSTEMS; NONMETALS; OPTICAL DESIGN; PHOTORESISTS; PHYSICAL VAPOR DEPOSITION; POROUS SILICON; PRESSURE DROP; PULSED LASER DEPOSITION; SENSORS; SILICON; THICK FILMS; TITANIUM; TITANIUM OXIDES; TRANSDUCERS; ZINC;

ALD; ALUMINA PORES; ALUMINIUM OXIDE; ANODIC ALUMINA; ATOMIC LAYER DEPOSITIONS; ETCHED PORES; HIGH ASPECT RATIO; INTERNATIONAL CONFERENCES; MACRO-POROUS SILICON; MICROPORES; NANOPORES; SOLID-STATE SENSORS; THIN FILMS; TITANIUM DIOXIDE; ZINC OXIDE;

ATOMIC LAYER DEPOSITION;

EID: 50049106750     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2007.4300182     Document Type: Conference Paper

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