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Volumn 14, Issue 9-11, 2008, Pages 1515-1523

Stress engineering and mechanical properties of SU-8-layers for mechanical applications

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRONIC EQUIPMENT TESTING; LASER INTERFEROMETRY; MECHANICAL PROPERTIES; TECHNOLOGY;

EID: 49949099241     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0534-7     Document Type: Conference Paper
Times cited : (53)

References (16)
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    • 0031702558 scopus 로고    scopus 로고
    • Dependence of the quality of thick resist structures on resist baking
    • Bleidiessel G et al (1998) Dependence of the quality of thick resist structures on resist baking. Microelectronic Eng 41/42:433-436
    • (1998) Microelectronic Eng , vol.4142 , pp. 433-436
    • Bleidiessel, G.1
  • 2
    • 49949112779 scopus 로고    scopus 로고
    • BMBF-Projekt SU-8-Cantilever-design, Herstellung und Applikationen sowie mikroskalierte Kraftsensoren. Projekt Nr.: W3003/W3004, Fördernr.: 16SV2274 Zeitraum: 06/2006-09/2007
    • BMBF-Projekt (2007) SU-8-Cantilever-design, Herstellung und Applikationen sowie mikroskalierte Kraftsensoren. Projekt Nr.: W3003/W3004, Fördernr.: 16SV2274 Zeitraum: 06/2006-09/2007
    • (2007)
  • 3
    • 33845732673 scopus 로고    scopus 로고
    • Deep X-ray lithography of SU-8 photoresist: Influence of process parameters and conditions
    • Gyeongju, Korea
    • Desta Y (2005) Deep X-ray lithography of SU-8 photoresist: influence of process parameters and conditions. In: Proceedings of the HARMST Conference 2005, Gyeongju, Korea
    • (2005) Proceedings of the HARMST Conference 2005
    • Desta, Y.1
  • 6
    • 0000196419 scopus 로고    scopus 로고
    • Soft entirely photoplastic probes for scanning force microscopy
    • 5
    • Genolet G et al (1999) Soft entirely photoplastic probes for scanning force microscopy. Rev Sci Instr 70(5):2398
    • (1999) Rev Sci Instr , vol.70 , pp. 2398
    • Genolet, G.1
  • 9
    • 0345376280 scopus 로고    scopus 로고
    • Fabrication of atomic force microscope probe with low spring constant using SU-8 photoresist
    • Lee J et al (2003) Fabrication of atomic force microscope probe with low spring constant using SU-8 photoresist. Jpn J Appl Phys 42:1171
    • (2003) Jpn J Appl Phys , vol.42 , pp. 1171
    • Lee, J.1
  • 10
    • 0030411924 scopus 로고    scopus 로고
    • Influence of resist baking on the pattern quality of thick photoresist
    • In: Pang S, Chang S (eds). Proc SPIE
    • Löchel B et al (1996) Influence of resist baking on the pattern quality of thick photoresist. In: Pang S, Chang S (eds) Micromachining and microfabrication process technology II. Proc SPIE 2879:174-181
    • (1996) Micromachining and Microfabrication Process Technology II , vol.2879 , pp. 174-181
    • Löchel, B.1
  • 12
    • 0011380658 scopus 로고    scopus 로고
    • MicroChem Corp Page 3, Table 1
    • MicroChem Corp. (2007) Material safety data sheet, Page 3, Table 1
    • (2007) Material Safety Data Sheet
  • 16
    • 0000073841 scopus 로고
    • The tension of metallic films deposited by electrolysis
    • Stoney GG (1909) The tension of metallic films deposited by electrolysis. Proc R Soc Sen Lond A 82: 172-175
    • (1909) Proc R Soc Sen Lond A , vol.82 , pp. 172-175
    • Stoney, G.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.