Crystalline structure of ceria particles controlled by the oxygen partial pressure and STI CMP performances

Ultramicroscopy

Volumn 108, Issue 10, 2008, Pages 1292-1296

  Kim, Ye Hwan ^a   Kim, Sang Kyun ^b   Kim, Namsoo ^b   Park, Jea Gun ^a   Paik, Ungyu ^a  

^a Hanyang University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Ceria; Chemical mechanical planarization; Crystalline structure

Indexed keywords

CALCINATION; CONCENTRATION (PROCESS); CRYSTALLINE MATERIALS; DIFFRACTION; HOLOGRAPHIC INTERFEROMETRY; NANOTECHNOLOGY; NONMETALS; OXYGEN; PARTIAL PRESSURE; POSITIVE IONS; SEMICONDUCTING SILICON; SPEECH ANALYSIS; SUBSTITUTION REACTIONS;

CERIA; CERIA PARTICLES; CHEMICAL MECHANICAL PLANARIZATION; CRYSTALLINE STRUCTURE; CRYSTALLINE STRUCTURES; FLUORITE STRUCTURES; HIGH-RESOLUTION TEM; NANO-BEAM DIFFRACTION; NANO-SIZED; OXYGEN CONCENTRATIONS; OXYGEN PARTIAL PRESSURE; REACTION SITES; SHALLOW-TRENCH ISOLATION; SOLID-STATE DISPLACEMENT REACTION;

CERIUM COMPOUNDS;

CERIUM; CERIUM OXIDE; NANOPARTICLE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL REACTION; CRYSTAL STRUCTURE; OXYGEN TENSION; PARTICLE SIZE; SYNTHESIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 49949096164     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2008.04.079     Document Type: Article

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