Activated reactive evaporation deposited silicon nitride as a masking material for MEMS fabrication

Journal of Micromechanics and Microengineering

Volumn 15, Issue 10, 2005, Pages 1956-1962

  Patil, Sheetal J ^a   Gangal, S A ^a  

^a UNIVERSITY OF PUNE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ACTIVATED REACTIVE EVAPORATION (ARE); E-BEAM EVAPORATION; NITROGEN GAS PLASMA; SILICON NITRIDE FILMS;

SILICON NITRIDE;

EID: 24644482681     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/10/023     Document Type: Article

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