Preparation of TiO2 nanowire gas nanosensor by AFM anode oxidation

Ultramicroscopy

Volumn 108, Issue 10, 2008, Pages 1334-1337

  Li, Zhen ^a   Wu, Minghong ^a   Liu, Tiebing ^a   Wu, Chao ^a   Jiao, Zheng ^a   Zhao, Bing ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

AFM anode oxidation; Gas nanosensor; Nanowire; TiO2

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC WIRE; HYDROGEN; METALS; MICROSCOPIC EXAMINATION; NONMETALS; OPTICAL DESIGN; SCANNING PROBE MICROSCOPY; THICK FILMS;

AFM ANODE OXIDATION; AFM CANTILEVERS; CHEMICAL-; GAS NANOSENSOR; HYDROGEN SENSORS; METAL SEMICONDUCTORS; NANO WIRES; NANOWIRE; REACTION MECHANISMS; TIO2;

IMAGING TECHNIQUES;

HYDROGEN; METAL; NANOWIRE; OXIDE; TITANIUM DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; ENVIRONMENTAL TEMPERATURE; GAS ANALYSIS; LOW TEMPERATURE; NANOSENSOR; OXIDATION; SEMICONDUCTOR;

EID: 49949091062     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2008.04.059     Document Type: Article

References (22)

1. Hu J., Odom T.W., and Lieber C.M. Acc. Chem. Res. 32 (1999) 435
2. Sasaki T., Nakano S., Yamauchi S., and Watanabe M. Chem. Mater. 9 (1997) 602
3. Martinelli G., Carotta M.C., Traversa E., and Ghiotti G. MRS Bull. 24 (1999) 30
4. Lei Y., Zhang L.D., and Fan J.C. Chem. Phys. Lett. 338 (2001) 231
5. Kong J., Franklin N.R., Zhou C., Chapline M.G., Peng S., Cho K., and Dai H. Science 287 (2000) 622
6. Cui Y., Wei Q., Park H., and Lieber C.M. Science 293 (2001) 1289
7. Kumar S., Rajaraman S., Gerhardt R.A., Wang Z.L., and Hesketh P.J. Electrochim. Acta 51 (2005) 943
8. Matsuda S. Appl. Catal. 8 (1983) 149
9. Dagan G., and Tomkiewics M. J. Phys. Chem. 97 (1993) 12651
10. Sun Z., Wolkenhauer M., Bumbu G.G., Kim D.H., and Gutmann J.S. Physica B 28 (2005) 141
11. Li G.L., and Wang G.H. Nanostruct. Mater. 11 (1999) 663
12. Wang J., Sun J.Q., and Bian X.F. Mater. Sci. Eng. A 397 (2004) 7
13. Ye X.S., Sha J., Jiao Z.K., and Zhang L.D. Nanostruct. Mater. 8 (1997) 919
14. Dagata J.A., Schneir J., Harary H.H., Evans C.J., Postek M.T., and Bennett J. Appl. Phys. Lett. 56 (1990) 2001
15. Sugimura H., Uchida T., Kitamura N., and Masuhara H. J. Vac. Sci. Technol. B 12 (1994) 2884
16. Matsumoto K., Takahashi S., Ishii M., Hoshi M., Kurokawa A., Ichimura S., and Ando A. Jpn. J. Appl. Phys. 34 (1995) 1387
17. Matsuomoto K., Ishii M., Segawa K., Oka Y., Vartanian B.J., and Harris J.S. Appl. Phys. Lett. 68 (1996) 34
18. Gordon A.E., Fayfield R.T., Litfin D.D., and Higman T.K. J. Vac. Sci. Technol. B 13 (1995) 805
19. Snow E.S., and Campbell P.M. Physica B 227 (1996) 279
20. Held R., Heinzel T., Studerus P., and Ensslin K. Physica E 2 (1998) 748
21. Irmer B., Kehrle M., Lorenz H., and Kotthaus J.P. Semicond. Sci. Technol. 13 (1998) 79
22. Huh C., and Park S.J. J. Vac. Sci. Technol. B 18 (2000) 55