Investigation of the effect of calcination temperature on HMDS-treated ordered mesoporous silica film

Journal of Colloid and Interface Science

Volumn 326, Issue 1, 2008, Pages 186-190

  Ha, Tae Jung ^a   Park, Hyung Ho ^a   Jung, Sang Bae ^b   Ryu, Hojun ^c   Yu, Byoung Gon ^c  

^a Yonsei University   (South Korea)

^b LG Chemical Ltd   (South Korea)

^c Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Brij 76; Calcination; HMDS; MTES; Ordered mesoporous silica film

Indexed keywords

BLOCK COPOLYMERS; CALCINATION; CERAMIC CAPACITORS; DELAY CIRCUITS; DIELECTRIC WAVEGUIDES; ELECTRONICS INDUSTRY; INTEGRATED CIRCUITS; MECHANICAL PROPERTIES; MESOPOROUS MATERIALS; ORGANIC POLYMERS; PERMITTIVITY; POLYMERS; SILICA; SILICATE MINERALS; SILICON; SILICON COMPOUNDS; SURFACE TREATMENT;

BRIJ-76; CALCINATION TEMPERATURES; DIELECTRIC CONSTANTS; HEXAMETHYL DISILAZANE; HMDS; INTER-METAL DIELECTRIC; LOW DIELECTRIC CONSTANT; MTES; ORDERED MESOPOROUS SILICA; ORDERED MESOPOROUS SILICA FILM; SIGNAL DELAYS; SILICA PRECURSORS; SINGLE BONDS; ULTRA-LARGE-SCALE INTEGRATED CIRCUITS;

DIELECTRIC MATERIALS;

COPOLYMER; HEXAMETHYLDISILAZANE; SILANE DERIVATIVE; SILICON; SILICON DIOXIDE; TETRAETHOXYSILANE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL STRUCTURE; DIELECTRIC CONSTANT; ELECTRICITY; MOLECULAR DYNAMICS; MOLECULAR INTERACTION; MOLECULAR MECHANICS; POROSITY; PRIORITY JOURNAL; SURFACE PROPERTY; TEMPERATURE DEPENDENCE; THERMOSTABILITY; X RAY DIFFRACTION; YOUNG MODULUS;

EID: 49749128754     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2008.07.024     Document Type: Article

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