An investigation of an etch-through process on porous silicon

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 4, Issue 6, 2007, Pages 2006-2010

  Kan, P Y Y ^a   Finstad, T G ^a  

^a UNIVERSITY OF OSLO   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED SURFACE; ELECTROCHEMICAL ANODISATION; ELECTRON MICROSCOPY.; ETCH DATA; POROUS SILICON (PS); PS MEMBRANE; STATISTICAL PROCESSING;

CEMENTS; ETCHING; IMAGING TECHNIQUES; NONMETALS; OPTICAL DESIGN; POROUS SILICON; SILICON; SILICON WAFERS; SURFACE ANALYSIS;

ELECTROCHEMICAL ETCHING;

EID: 49749121112     PISSN: 18626351     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssc.200674353     Document Type: Conference Paper

References (8)

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7. P.Y.Y. Kan and T.G. Finstad, Proc. EMRS Spring Meeting 2005, L-I.03.
8. S. Lolkes, M. Kemell, J. Carstensen, S. Langa, and H. Föll, phys. stat. sol. (a) 202, 1369-1373 (2005).