Comparison between models of insulator and semiconductor thin films islanding

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 4, Issue 3, 2007, Pages 1189-1192

  Lallet, François ^a   Dauger, Alain ^a   Olivi Tran, Nathalie ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BOTTOM-UP; CHEMICAL VAPOR DEPOSITION (CVD); FILM SURFACES; FUNDAMENTAL DIFFERENCES; ISLANDING; LAYER-BY-LAYER DEPOSITION; PHYSICAL PHENOMENON; PHYSICAL VAPOR DEPOSITION (PVD); SELF-ORGANIZED QUANTUM DOTS; SEMICONDUCTOR THIN FILMS; SIMPLE PHYSICAL MODELS; SOL-GEL ROUTES; SOL-GEL SYNTHESIS;

BUILDING MATERIALS; COLLOIDS; GELATION; GELS; INSULATING MATERIALS; INSULATION; MODELS; PHYSICAL VAPOR DEPOSITION; QUANTUM ELECTRONICS; SEMICONDUCTOR QUANTUM DOTS; SOL-GEL PROCESS; SOL-GELS; SOLS; SURFACE CHEMISTRY; SURFACE PHENOMENA; SYNTHESIS (CHEMICAL); THICK FILMS; THIN FILMS; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 49649126156     PISSN: 18626351     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssc.200673714     Document Type: Conference Paper

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