Molecular basis of DNA photodimerization: Intrinsic production of cyclobutane cytosine dimers

Journal of the American Chemical Society

Volumn 130, Issue 32, 2008, Pages 10768-10779

  Roca Sanjuán, Daniel ^a   Olaso González, Gloria ^a   González Ramírez, Israel ^a   Serrano Andrés, Luis ^a   Merchán, Manuela ^a  

^a UNIVERSITY OF VALENCIA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

BUTANE; OLIGOMERS; ORGANIC ACIDS;

CYCLOBUTANE; MOLECULAR BASES; PHOTO-DIMERIZATION; SINGLET MANIFOLD; SINGLET-TRIPLET;

NUCLEIC ACIDS;

CYTOSINE DERIVATIVE; DNA; ETHYLENE; OLIGONUCLEOTIDE; THYMINE;

ARTICLE; COVALENT BOND; DIMERIZATION; FLUORESCENCE; GENOTOXICITY; IRRADIATION; PHOTOCHEMISTRY; PHOTOREACTIVITY; PHOTOSENSITIZATION; PHOTOTOXICITY; SPECTRAL SENSITIVITY;

CYTOSINE; DIMERIZATION; DNA; DNA DAMAGE; NUCLEIC ACID CONFORMATION; PHOTOCHEMISTRY; PYRIMIDINE DIMERS; ULTRAVIOLET RAYS;

EID: 49549088826     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja803068n     Document Type: Article

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