Effect of lattice-misfit strain on the process-induced imprint behavior in epitaxial Pb(Zr0.52Ti0.48)O3 thin films

Applied Physics Letters

Volumn 85, Issue 9, 2004, Pages 1583-1585

  Wu, Wenbin ^a   Wang, Y ^b   Pang, G K H ^b   Wong, K H ^b   Choy, C L ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITORS; COERCIVE FORCE; ELECTRIC FIELDS; ELECTRODES; EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; HYSTERESIS; LATTICE CONSTANTS; LEAD COMPOUNDS; POLARIZATION; PULSED LASER DEPOSITION; RELAXATION PROCESSES; X RAY DIFFRACTION ANALYSIS;

COERCIVE FIELDS; COERCIVE VOLTAGE; LATTICE DEFORMATION; LATTICE DISORDERS;

THIN FILMS;

EID: 4944256178     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1786662     Document Type: Article

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